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Please use this identifier to cite or link to this item: http://hdl.handle.net/11133/654

Title: MOS界面準位密度の自動測定
Other Titles: MOS カイメン ジュンイ ミツド ノ ジドウ ソクテイ
Automatic Measurements of Interface-State Densities in MOS Structures
Authors: 徳田, 豊
TOKUDA, Yutaka
Issue Date: 31-Mar-1983
Publisher: 愛知工業大学
Abstract: The microcomputer-controlled DLTS system for the automatic measurements of interface-state densities in MOS structures is described. The present system can draw curves of the interface-state densities versus temperature or energy level during a DLTS thermal scan. Therefore, this system allows the rapid evaluation of the interface-state densities and is suitable to the MOS process control. Experimental results are given for the nSi-SiO_2 interface.
URI: http://hdl.handle.net/11133/654
Appears in Collections:18号

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