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Please use this identifier to cite or link to this item:
http://hdl.handle.net/11133/654
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Title: | MOS界面準位密度の自動測定 |
Other Titles: | MOS カイメン ジュンイ ミツド ノ ジドウ ソクテイ Automatic Measurements of Interface-State Densities in MOS Structures |
Authors: | 徳田, 豊 TOKUDA, Yutaka |
Issue Date: | 31-Mar-1983 |
Publisher: | 愛知工業大学 |
Abstract: | The microcomputer-controlled DLTS system for the automatic measurements of interface-state densities in MOS structures is described. The present system can draw curves of the interface-state densities versus temperature or energy level during a DLTS thermal scan. Therefore, this system allows the rapid evaluation of the interface-state densities and is suitable to the MOS process control. Experimental results are given for the nSi-SiO_2 interface. |
URI: | http://hdl.handle.net/11133/654 |
Appears in Collections: | 18号
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