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Please use this identifier to cite or link to this item: http://hdl.handle.net/11133/1587

Title: Hイオン注入されたシリコンの欠陥分布観察
Other Titles: Hイオン チュウニュウ サレタ シリコン ノ ケッカン ブンプ カンサツ
Observation of Defect Distribution in H Ion Implanted Silicon
Authors: 岩田, 博之
高木, 誠
徳田, 豊
井村, 徹
IWATA, Hiroyuki
TAKAGI, Makoto
TOKUDA, Yutaka
IMURA, Toru
Issue Date: 30-Jun-2000
Publisher: 愛知工業大学
Abstract: The fundamental mechanism of the hydrogen exfoliation phenomenon that occurs at the damaged layer in H ion implanted silicon was investigated. A damaged layer formed by high-dose hydrogen implantation in a silicon wafer was observed by cross sectional transmission electron microscopy (XTEM), and (100) defects and (111) defects were visible. Density and size of the defects in the damaged layer were analyzed quantitatively. Although the density and size of (100) defects are almost twice those of (111) defects, the density of (111) defects in the deeper area is greater than the density of (100) defects . Neither the densities nor size of either (100) or 16 (111) defects have any relation with implantation dose in the dose range from 5.0x10^<16> to 8.0x10^<16> [Hcm^<-2>]. The sizes of (111) defects in the deeper area approach a certain size (about 10nm), because of their partial combination with (100) defects.
URI: http://hdl.handle.net/11133/1587
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