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Please use this identifier to cite or link to this item: http://hdl.handle.net/11133/1060

Title: レーザを用いたリソグラフィ用マスクアライナの開発
Other Titles: レーザ オ モイチタ リソグラフィヨウ マスクアライナ ノ カイハツ
Development of A Mask-Aligner using A Laser for the Lithographic Processes
Authors: 周, 礼中
劉, 京南
古橋, 秀夫
内田, 悦行
ZHOU, Li-Zhong
LIU, Jingnan
UCHIDA, Yoshiyuki
Issue Date: 31-Mar-1998
Publisher: 愛知工業大学
Abstract: Precision linear-position control using moire signals have been investigated for a mask-alignment on the lithographic processes. Differential moire technique using two grating pairs 180°out of phase was used. With the reduction of the noises, and improvement of the stability of the laser out put power, the linear-alignment accuracy of ±4nm was obtained. Furthermore, rotational-position control using differential moire technique has been investigated. The rotational-alignment accuracy of ±4×(10)^<-7> rad has been obtained.
URI: http://hdl.handle.net/11133/1060
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