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A1 愛知工業大学研究報告 >
3．愛知工業大学研究報告 .B(1976-2007) >
33号 >
Please use this identifier to cite or link to this item:
http://hdl.handle.net/11133/1060
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| Title: | レーザを用いたリソグラフィ用マスクアライナの開発 |
| Other Titles: | レーザ オ モイチタ リソグラフィヨウ マスクアライナ ノ カイハツ
Development of A Mask-Aligner using A Laser for the Lithographic Processes |
| Authors: | 周, 礼中
劉, 京南
古橋, 秀夫
内田, 悦行
ZHOU, Li-Zhong
LIU, Jingnan
FURUHASHI, Hideo
UCHIDA, Yoshiyuki |
| Issue Date: | 31-Mar-1998 |
| Publisher: | 愛知工業大学 |
| Abstract: | Precision linear-position control using moire signals have been investigated for a mask-alignment on the lithographic processes. Differential moire technique using two grating pairs 180°out of phase was used. With the reduction of the noises, and improvement of the stability of the laser out put power, the linear-alignment accuracy of ±4nm was obtained. Furthermore, rotational-position control using differential moire technique has been investigated. The rotational-alignment accuracy of ±4×(10)^<-7> rad has been obtained. |
| URI: | http://hdl.handle.net/11133/1060 |
| Appears in Collections: | 33号
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