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  <channel rdf:about="http://hdl.handle.net/11133/48">
    <title>DSpace コレクション: 2000-06</title>
    <link>http://hdl.handle.net/11133/48</link>
    <description>2000-06</description>
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        <rdf:li rdf:resource="http://hdl.handle.net/11133/1590" />
        <rdf:li rdf:resource="http://hdl.handle.net/11133/1591" />
        <rdf:li rdf:resource="http://hdl.handle.net/11133/1592" />
        <rdf:li rdf:resource="http://hdl.handle.net/11133/1587" />
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    </items>
    <dc:date>2026-04-17T19:17:49Z</dc:date>
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  <item rdf:about="http://hdl.handle.net/11133/1590">
    <title>画像映像情報の立体可視化技法に関する研究</title>
    <link>http://hdl.handle.net/11133/1590</link>
    <description>タイトル: 画像映像情報の立体可視化技法に関する研究
著者: 辻岡, 勝美; 古橋, 秀夫; 秦野, 和郎; 比嘉, 俊太郎; 内田, 悦行; 與語, 照明; 劉, 京南; CHITNIS, Vijay T
抄録: An automatic measuring system of three-dimensional shapes by a projection method with grating pattern from an optical spatial modulator has been developed. The characteristics of the system were studied. This system is composed of a projector, an optical spatial modulator, a CCD camera, and a computer. A liquid crystal is used as the optical spatial modulator. The grating patterns that are projected  on the surface of the object are controlled by the computer-connected with the optical spatial modulator. The projected patterns are measured by the CCD camera. The date are transferred to the computer. After a transformation into line date, the date are analyzed to obtain the coordinate of the surface of the object.  This system has following advantages. (1)It is possible to capture the surface topography without any contact. (2)The time required for the measurements is shorter than the light-section method. (3)An optical spatial modulator using a liquid crystal is possible to control the grating patterns accurately by a computer.</description>
    <dc:date>2000-06-29T15:00:00Z</dc:date>
  </item>
  <item rdf:about="http://hdl.handle.net/11133/1591">
    <title>占有帯域幅4MHzチャンネル上における連続チップ波形整形技術を適用した1.6Mbps/4Mcps差分CDMAの伝送特性</title>
    <link>http://hdl.handle.net/11133/1591</link>
    <description>タイトル: 占有帯域幅4MHzチャンネル上における連続チップ波形整形技術を適用した1.6Mbps/4Mcps差分CDMAの伝送特性
著者: 岸, 政七
抄録: From the frequency usage efficiency points of view, the novel diffCDMA with continuous chip shaping is proposed in this paper to achieve such high reliability as shown in free space propagation. Continuous chip shaping is facilitated by substituting smoothing function over adjacent chip fringes, in which the function touches current and next chips with 0th order contact and varies with the steepest gradient just at the center The diffCDMA is verified through simulations over such urban multi-ray Rayleigh fading environment as poor and narrow 4MHz bandwidth radio channel for 1.6Mbps transmission via 4Mcps to be error free by employing both continuous chip shaping in direct spectrum scrambling and BCH(63, 51) double error correction code.</description>
    <dc:date>2000-06-29T15:00:00Z</dc:date>
  </item>
  <item rdf:about="http://hdl.handle.net/11133/1592">
    <title>ジアシルヒドラジン類の核剤作用の熱安定性に関する研究</title>
    <link>http://hdl.handle.net/11133/1592</link>
    <description>タイトル: ジアシルヒドラジン類の核剤作用の熱安定性に関する研究
著者: 吉川, 俊夫
抄録: The property of diacylhydrazine(DHZ) as a crystal nucleating agent for polypropylene(PP) was studied by differential scanning calorimeter(DSC) by measuring the effect of additives on the crystallization temperature(Tc) of PP. Aromatic, aliphatic and mixed-type DHZ were synthesized and used as an additive. The nucleating activity of a DHZ was defined as the rise in Tc by its addition. From the Tc values observed, the eighteen DHZ's studied were classified into three groups; (a) DHZ's with thermally stable adtivity, (b) inactive DHZ's and (C)DHZ'S with thermally unstable activity.</description>
    <dc:date>2000-06-29T15:00:00Z</dc:date>
  </item>
  <item rdf:about="http://hdl.handle.net/11133/1587">
    <title>Hイオン注入されたシリコンの欠陥分布観察</title>
    <link>http://hdl.handle.net/11133/1587</link>
    <description>タイトル: Hイオン注入されたシリコンの欠陥分布観察
著者: 岩田, 博之; 高木, 誠; 徳田, 豊; 井村, 徹
抄録: The fundamental mechanism of the hydrogen exfoliation phenomenon that occurs at the damaged layer in H ion implanted silicon was investigated. A damaged layer formed by high-dose hydrogen implantation in a silicon wafer was observed by cross sectional transmission electron microscopy (XTEM), and (100) defects and (111) defects were visible. Density and size of the defects in the damaged layer were analyzed quantitatively. Although the density and size of (100) defects are almost twice those of (111) defects, the density of (111) defects in the deeper area is greater than the density of (100) defects . Neither the densities nor size of either (100) or 16 (111) defects have any relation with implantation dose in the dose range from 5.0x10^&lt;16&gt; to 8.0x10^&lt;16&gt; [Hcm^&lt;-2&gt;]. The sizes of (111) defects in the deeper area approach a certain size (about 10nm), because of their partial combination with (100) defects.</description>
    <dc:date>2000-06-29T15:00:00Z</dc:date>
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